Electrowetting-based actuation of droplets for integrated microfluidics

Lab on a Chip

Volumn 2, Issue 2, 2002, Pages 96-101

  Pollack, M G ^a   Shenderov, A D ^b   Fair, R B ^a  

^a Duke University   (United States)

^b Nanolytics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTE; GLASS; ION CHANNEL;

AQUEOUS SOLUTION; ARTICLE; ELECTRIC POTENTIAL; FLOW KINETICS; FLOW RATE; LIQUID; PRIORITY JOURNAL;

EID: 0012637388     PISSN: 14730197     EISSN: None     Source Type: Journal    
DOI: 10.1039/b110474h     Document Type: Article

References (36)

1. Microsystem Technology in Chemistry and Life Sciences, eds.A. Manz and H. Becker, Springer, Berlin, Germany, 1998.
2. P. Gravesen, J. Branebjerg and O. S. Jensen, J. Micromech. Microeng., 1993, 3, 168.
3. M. Elwenspoek, T. S. J. Lammerink, R. Mikaye and J. H. J. Fluitman, J. Micromech. Microeng., 1994, 4, 227.
4. S. Shoji and M. Esashi, J. Micromech, Microeng., 1994, 4, 157.
5. C. H. Mastrangelo, M. A. Burns and D. T. Burke, Proc. IEEE, 1998, 86, 1769.
6. G. J. M. Bruin, Electrophoresis, 2000, 21, 3931.
7. K. Hosokawa, T. Fujii and I, Endo, Anal. Chem., 1999, 71, 4781.
8. K. Handique, D. T. Burke, C. H. Mastrangelo and M. A. Burns, Anal. Chem., 2000, 72, 4100.
9. K. Handique, D. T. Burke, C. H. Mastrangelo and M. A. Burns, Anal. Chem., 2001, 73, 1831.
10. M. A, Burns, C. H. Mastrangelo, T. S. Sammarco, F. P. Man, J. R. Webster, B. N. Johnson, B. Foerster, D. Jones, Y. Fields, A. R. Kaiser and D. T. Burke, Proc. Natl. Acad. Sci. U.S.A., 1996, 93, 5556.
11. T. S. Sammarco and M. A. Burns, AIChE J., 1999, 45, 350.
12. B. S. Gallardo, V. K. Gupta, F. D. Eagerton, L. I. Jong, V. S. Craig, R. R. Shah and N. L. Abbott, Science (Washington, D.C.), 1999, 283, 57.
13. O. Sandre, L. Gorre-Talini, A. Ajdari, J. Prost and P. Silberzan, Phys. Rev. E, 1999, 60, 2964.
14. K. Ichimura, S. Oh and M. Nakagawa, Science (Washington, D.C.), 2000, 288, 1624.
15. T. B. Jones, M. Gunji, M. Washizu and M. J. Feldman, J. Appl. Phys., 2001, 89, 1441.
16. J. Lee and C. J. Kim, J. Microelectromech. Syst., 2000, 9, 171.
17. M. Washizu, IEEE Trans. Ind. Appl., 1998, 34, 732.
18. M. G. Pollack, R. B. Fair and A. D. Shenderov, Appl. Phys. Lett., 2000, 77, 1725.
19. G. Beni and S. Hackwood, Appl. Phys. Lett., 1981, 38, 207.
20. G. Beni and M. A. Tenan, J. Appl. Phys., 1981, 52, 6011.
21. E. Colgate and H. Matsumoto, J. Vac. Sci. Technol., A, 1990, 8, 3625.
22. B. Berge, C.R.A.S. III, 1993, 317, 157.
23. J. A. M. Sondag-Huethorst and L. G. J. Fokkink, Langmuir, 1994, 10, 4380.
24. M. Vallet, B. Berge and L. Vovelle, Polymer, 1996, 37, 2465.
25. W. J. J. Welters and L. G. J. Fokkink, Langmuir, 1998, 14, 1535.
26. H. J. J. Verheijen and M. W. J. Prins, Rev. Sci. Instrum., 1999, 70, 3668.
27. H. J. J. Verheijen and M. W. J. Prins, Langmuir, 1999, 15, 6616.
28. V. Peykov, A. Quinn and J. Ralston, Colloid Polym. Sci., 2000, 278, 789.
29. C. B. Gorman, H. A. Biebuyck and G. M. Whitesides, Langmuir, 1995, 11, 2242.
30. B. Berge and J. Peseux, Eur. Phys. J. E., 2000, 3, 159.
31. M. W. J. Prins, W. J. J. Welters and J. W. Weekamp, Science (Washington, D.C.), 2001, 291, 277.
32. E. Seyrat and R. A. Hayes, J. Appl. Phys., 2001, 90, 1383.
33. C. Quillet and B. Berge, Curr. Opin. Colloid Interface Sci., 2001, 6, 34.
34. A. Torkkeli, J. Saarilahti, A. Haara, H. Harma, T. Soukka and P. Tolonen, Proc. IEEE MEMS, 2000, 475.
35. M. K. Chaudhury and G. M. Whitesides, Science (Washington, D.C.), 1992, 256, 1539.
36. A. W. Adamson and A. P. Gast, Physical Chemistry of Surfaces, Wiley, New York, 1997.