Probing patterned wafer structures by means of grazing incidence x-ray fluorescence analysis

ECS Transactions

Volumn 25, Issue 3, 2009, Pages 441-451

  Osan J ^a   Reinhardt, F ^b   Beckhoff, B ^b   Pap, A E ^a   Torok S ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; SEMICONDUCTOR MATERIALS; SYNCHROTRON RADIATION; X RAYS;

ARTIFICIAL STRUCTURES; MONOCHROMATIZED SYNCHROTRON RADIATION; NANO-SCALED STRUCTURES; PHYSIKALISCH-TECHNISCHE BUNDESANSTALT; SEMI-CONDUCTOR SURFACES; TOTAL REFLECTION X-RAY FLUORESCENCE; X RAY FLUORESCENCE ANALYSIS; X-RAY STANDING WAVES;

STANDING WAVE METERS;

EID: 77649225599     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3204435     Document Type: Conference Paper

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