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Volumn 31, Issue 3, 2010, Pages 243-245

Influence of fin width on the total dose behavior of p-channel bulk MuGFETs

Author keywords

Bulk multiple gate field effect transistors (MuGFETs); Gamma radiation; Geometric dependence

Indexed keywords

FIN WIDTHS; GAMMA RADIATION; MULTIPLE-GATE FIELD-EFFECT TRANSISTORS; RADIATION BEHAVIOR; RADIATION-INDUCED; SHALLOW TRENCH ISOLATION; TOTAL DOSE;

EID: 77649180158     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2009.2039633     Document Type: Article
Times cited : (29)

References (6)
  • 5
    • 37249015970 scopus 로고    scopus 로고
    • Geometry and strain dependence of the proton radiation behavior of MuGFET devices
    • Dec.
    • S. Put, E. Simoen, N. Collaert, C. Claeys, M. Van Uffelen, and P. Leroux, "Geometry and strain dependence of the proton radiation behavior of MuGFET devices," IEEE Trans. Nucl. Sci., vol.54, no.6, pp. 2227-2232, Dec. 2007.
    • (2007) IEEE Trans. Nucl. Sci. , vol.54 , Issue.6 , pp. 2227-2232
    • Put, S.1    Simoen, E.2    Collaert, N.3    Claeys, C.4    Van Uffelen, M.5    Leroux, P.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.