Gas phase study of systems for the CVD of silver

Chemical Vapor Deposition

Volumn 9, Issue 3, 2003, Pages 144-148

  Haase, Thomas ^a   Kohse Höinghaus, Katharina ^a   Atakan, Burak ^a,c   Schmidt, Heike ^b   Lang, Heinrich ^b  

^a BIELEFELD UNIVERSITY   (Germany)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^c UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Mass spectrometry; Precursor systems; Silver

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; EVAPORATION; MASS SPECTROMETRY; MOLECULAR BEAM EPITAXY; RESIDUAL STRESSES; SPUTTERING; SURFACE CHEMISTRY; THERMODYNAMIC STABILITY;

GAS PHASE ANALYSIS; INTERCONNECT MATERIALS; PRECURSOR SYSTEMS; SIGNAL PROPAGATION DELAYS;

SILVER;

EID: 10644260437     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306244     Document Type: Article

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