The effects of oxidants on the growth behavior of PbTiO3 thin film by atomic layer deposition

ECS Transactions

Volumn 19, Issue 2, 2009, Pages 829-841

  Lee, Hyun Ju ^a   Park, Min Hyuk ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM GROWTH; HIGH-K DIELECTRIC; LEAD OXIDE; LEAD TITANATE; LOW-K DIELECTRIC; NITRIDES; OXIDANTS; OXIDE MINERALS; SILICA; SILICON NITRIDE; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

ADSORPTION OF PB; CATALYTIC EFFECTS; CONCENTRATION RATIO; ENHANCED GROWTH; GROWTH BEHAVIOR; GROWTH STEPS; SUBSTRATE TEMPERATURE; TI PRECURSOR;

GROWTH RATE;

EID: 76549110000     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3122137     Document Type: Conference Paper

References (15)

1. U. Bottger and S. R. Scott, in Nanoelectronics and Information Technology, R. Waser, Editor, Chap. 22, WILEY-VCH, Weinheim, Germany (2003).
2. J. F. Scott, Ferroelectric Memories, Springer, Heidelberg, Germany (2000).
3. H. Kohlstedt and H. Ishiwara, in Nanoelectronics and Information Technology, R. Waser, Editor, Chap. 14, WILEY-VCH, Weinheim, Germany (2003).
4. J. Ricote, S. Holgado, P. Ramos, and M. L. Calzada, IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 53, 2299 (2006).
5. K. Kim and S. Lee, J. Appl. Phys., 100, 051604 (2006).
6. J. M. Koo, B. S. Seo, S. P. Kim, S. M. Shin, J. H. Lee, H. S. Baik, J. H. Lee, J. H. Lee, B. J. Bae, J. E. Lim, D. C. Yoo, S. O. Park, H. S. Kim, H. Han, S. G. Baik, J. Y. Choi, Y. J. Park, and Y. S. Park, Tech. Dig. - Int. Electron Devices Meet., 539 (2005).
7. H. Funakubo, G. Asano, T. Ozeki, H. Machida, T. Yoneyana, and Y. Takamatsu, J. Electrochem. Soc., 151, C463 (2004).
8. G. J. Mormans, P. J. wan Veldhoven, and M. De Keijser, J. Cryst. Growth, 123, 537 (1992).
9. T. Suntola, Mater. Sci. Rep., 4, 261 (1989).
10. T. Watanabe, S. Hoffmann-Eifert, C. S. Hwang, and R. Waser, J. Electrochem. Soc., 153, F199 (2006).
11. T. Watanabe, S. Hoffmann-Eifert, C. S. Hwang, and R. Waser, J. Electrochem. Soc., 155, D715 (2008).
12. J. Harjuoja, A. Kosola, M. Putkonen, annd L. Niinisto, Thin Solid Films, 496, 346 (2006).
13. J. S. Zhao, J. S. Sim, H. J. Lee, D. Y. Park, G. W. Hwang, K. Lee, and C. S. Hwang, J. Electrochem. Soc. 153, F81, (2006).
14. H. J. Lee, G. H. Kim, K. Lee, and C. S. Hwang, Electrochem. Solid-State Lett., 10, G89 (2007).
15. M. Binnewies and E. Milke, Thermochemical Data of Elements and Compounds, WILEY-VCH, Weinheim, Germany (1999).