Initial growth behavior of a lead oxide thin film on ir substrates by atomic layer deposition

Electrochemical and Solid-State Letters

Volumn 10, Issue 12, 2007, Pages

  Lee, Hyun Ju ^a   Kim, Gun Hwan ^a   Lee, Keun ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; FILM GROWTH; FILM THICKNESS; GROWTH RATE; LEAD COMPOUNDS; SURFACE MORPHOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITION; DISTINCT DIFFERENCE; GROWTH BEHAVIOR; TWO THICKNESS REGIONS;

OXIDE FILMS;

EID: 35348842669     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2789286     Document Type: Article

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