Thermal stability of AlCoCrCuFeNi high entropy alloy thin films studied by in-situ XRD analysis

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1989-1992

  Dolique, V ^a   Thomann, A L ^a   Brault, P ^a   Tessier, Y ^a   Gillon, P ^b  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b CNRS   (France)

Author keywords

Alloys; Plasma sputtering deposition; Thermal stability; Thin films

Indexed keywords

BEFORE AND AFTER; CHEMICAL COMPOSITIONS; CRYSTALLINE PHASE TRANSFORMATION; HIGH ENTROPY ALLOYS; HIGH TEMPERATURE; IN-SITU X-RAY DIFFRACTION; IN-SITU XRD; INITIAL STRUCTURES; METALLIC ELEMENTS; MIXING ENTROPY; MOSAIC TARGET; PARTIAL EVAPORATION; PLASMA SPUTTERING; SEM; THERMAL STABILITY;

ANNEALING; CERIUM ALLOYS; CHEMICAL REACTIONS; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; ENTROPY; LITHIUM COMPOUNDS; MECHANICAL PROPERTIES; METALLIC COMPOUNDS; PLASMA DEPOSITION; PLASMA STABILITY; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; THERMODYNAMIC STABILITY; THIN FILM DEVICES; THIN FILMS; X RAY DIFFRACTION;

AMORPHOUS ALLOYS;

EID: 76549101189     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.12.006     Document Type: Article

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