Preparation and characterization of epitaxial LiNbO3 thin films by metal-organic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 9 B, 1999, Pages 5437-5441

  Shiratsuyu, Kosuke ^a   Sakurai, Atsushi ^a   Tanaka, Katsuhiko ^a   Sakabe, Yukio ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

Epitaxy; Lithium niobate; MOCVD; Thin film

Indexed keywords

CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; GRAIN SIZE AND SHAPE; LITHIUM NIOBATE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; SAPPHIRE; THIN FILMS; TWINNING;

FULL WIDTH AT HALF MAXIMUM (FWHM);

DIELECTRIC FILMS;

EID: 0033308907     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.5437     Document Type: Article

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