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Volumn 14, Issue 1, 2008, Pages 236-240

Wet etching pits of Pyrex glass for metallization

Author keywords

Electroplating; Mask; Pits; Pyrex; Wet etching

Indexed keywords


EID: 76449120040     PISSN: 10074252     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (4)

References (8)
  • 1
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    • A fast prototyping process for fabrication of microfluidic systems on soda-lime glass
    • Lin C H, Lee G B, Lin Y H, et al. A fast prototyping process for fabrication of microfluidic systems on soda-lime glass [J]. J Micromech Microeng, 2001, 11: 726-732.
    • (2001) J Micromech Microeng , vol.11 , pp. 726-732
    • Lin, C.H.1    Lee, G.B.2    Lin, Y.H.3
  • 2
    • 0035337220 scopus 로고    scopus 로고
    • Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices
    • Grosse A, Grewe M, Fouckhardt H. Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices[J]. J Micromech Microeng, 2001, 11: 257-262.
    • (2001) J Micromech Microeng , vol.11 , pp. 257-262
    • Grosse, A.1    Grewe, M.2    Fouckhardt, H.3
  • 3
    • 0032090541 scopus 로고    scopus 로고
    • Wet etching of borosilicate glass using an anodically bonded silicon substrate as mask
    • Cormany T, Enoksson P, Stemme Deep G. Wet etching of borosilicate glass using an anodically bonded silicon substrate as mask[J]. J Micromech Microeng, 1998, 8: 84-87.
    • (1998) J Micromech Microeng , vol.8 , pp. 84-87
    • Cormany, T.1    Enoksson, P.2    Stemme Deep, G.3
  • 4
    • 24044550345 scopus 로고    scopus 로고
    • The evaporated metal masks for chemical glass etching for BioMEMS
    • Mourzina Y, Steffen A, Offenhausser A. The evaporated metal masks for chemical glass etching for BioMEMS[J]. Microsystem technologies, 2005, 11: 135-140.
    • (2005) Microsystem technologies , vol.11 , pp. 135-140
    • Mourzina, Y.1    Steffen, A.2    Offenhausser, A.3
  • 5
    • 4544233318 scopus 로고    scopus 로고
    • A new masking technology for deep glass etching and its microfluidic application
    • Bu M, Melvin T, Ensell G J. A new masking technology for deep glass etching and its microfluidic application[J]. Sensors and Actuators A, 2004, 115: 476-482.
    • (2004) Sensors and Actuators A , vol.115 , pp. 476-482
    • Bu, M.1    Melvin, T.2    Ensell, G.J.3
  • 6
    • 15544373657 scopus 로고    scopus 로고
    • Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution
    • Iliescu C, Jing J, Tay F E H, et al. Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution[J]. Surface & Coatings Technology, 2005, 198: 314-318.
    • (2005) Surface & Coatings Technology , vol.198 , pp. 314-318
    • Iliescu, C.1    Jing, J.2    Tay, F.E.H.3
  • 7
    • 69749109847 scopus 로고    scopus 로고
    • Stress control in masking layers for deep wet micromachining of Pyrex glass
    • Iliescu C, Miao J, Tay F E H. Stress control in masking layers for deep wet micromachining of Pyrex glass[J]. Sensors and Actuators A, 2005, 117: 286-292.
    • (2005) Sensors and Actuators A , vol.117 , pp. 286-292
    • Iliescu, C.1    Miao, J.2    Tay, F.E.H.3
  • 8
    • 20044380766 scopus 로고    scopus 로고
    • Design of electrostatically levitated micro machined rotational gyroscope based on UV-LIGA technology
    • Beijing
    • Cui Feng, Chen Wenyuan, Su Yufeng, et al. Design of electrostatically levitated micro machined rotational gyroscope based on UV-LIGA technology[A]. Proceedings of SPIE on MEMS/MOEMS Technologies and Applications II[C]. Beijing, 2004. 264-275.
    • (2004) Proceedings of SPIE on MEMS/MOEMS Technologies and Applications II , pp. 264-275
    • Cui, F.1    Chen, W.2    Su, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.