Chemical vapor deposition and atomic layer deposition of coatings for mechanical applications

Journal of Thermal Spray Technology

Volumn 19, Issue 1-2, 2010, Pages 510-516

  Doll, G L ^a   Mensah, B A ^b   Mohseni, H ^b   Scharf, T W ^b  

^a Timken Technology Center   (United States)

^b UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

Atomic layer deposition; Chemical vapor deposition; Protective coatings; Tribology

Indexed keywords

BI-LAYER; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DEPOSITED FILMS; DEPOSITION METHODS; FILMS AND COATINGS; FRICTION AND WEAR; GASPHASE; MECHANICAL COMPONENTS; NANOLAMINATE; NON-LINE-OF-SIGHT; NOVEL STRUCTURES; PROCESSING TECHNIQUE; SITE-SPECIFIC; SUBSTRATE SURFACE; SURFACE ADSORPTION; THIN-FILM DEPOSITION TECHNIQUE; WEAR TRACKS;

ADSORPTION; ATOMIC LAYER DEPOSITION; ATOMS; CHEMISORPTION; DEPOSITION; DIAMOND FILMS; FILM THICKNESS; PHYSICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; SURFACE REACTIONS; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY;

CHEMICAL VAPOR DEPOSITION;

EID: 76449114553     PISSN: 10599630     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11666-009-9364-8     Document Type: Conference Paper

References (13)

1. KL Choy 2003 Chemical Vapor Deposition of Coatings Prog. Mater. Sci. 48 57 170 10.1016/S0079-6425(01)00009-3 1:CAS:528:DC%2BD38XoslChsL4%3D (Pubitemid 35412314)
2. W Wang T Moses RC Linares JE Shigley M Hall JE Butler 2003 Gem-Quality Synthetic Diamonds Grown by a Chemical Vapor Deposition (CVD) Method Gems Gemol. 39 268 283
3. MJ Rand JF Roberts 1968 Preparation and Properties of Thin Film Boron Nitride J. Electrochem. Soc. 115 423 429 10.1149/1.2411238 1:CAS:528: DyaF1cXptVOrtA%3D%3D
4. G. Savage, Carbon Carbon Composites, Springer, New York, 1993, p 85-113
5. T. Suntola and J. Anston, Method for Producing Compound Thin Films, U.S. Patent 4,058,430, 1977
6. T Suntola J Hyvärinen 1985 Atomic Layer Epitaxy Annu. Rev. Mater. Sci. 15 177 195 10.1146/annurev.ms.15.080185.001141 1:CAS:528:DyaL2MXltFentbk%3D
7. M. Ritala and M. Leskelä, Atomic Layer Deposition, Handbook of Thin Films, Vol 1, H.S. Nalwa, Ed., Academic Press, San Diego, 2002, p 103-159
8. SM George AW Ott JW Klaus 1996 Surface Chemistry for Atomic Layer Growth J. Phys. Chem. 100 13121 13131 10.1021/jp9536763 1:CAS:528:DyaK28Xkt1amsL0%3D
9. RL Puurunen 2005 Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process J. Appl. Phys. 97 121301 121352 10.1063/1.1940727 2005JAP....97l1301P (Pubitemid 40940570)
10. TW Scharf SV Prasad MT Dugger PG Kotula RS Goeke RK Grubbs 2006 Growth, Structure, and Tribological Behavior of Atomic Layer-Deposited Tungsten Disulphide Solid Lubricant Coatings with Applications to MEMS Acta Mater. 54 4731 4743 10.1016/j.actamat.2006.06.009 1:CAS:528:DC%2BD28XhtVWrtb3J (Pubitemid 44441947)
11. TW Scharf DR Diercks BP Gorman SV Prasad MT Dugger 2009 Atomic Layer Deposition of Tungsten Disulphide Solid Lubricant Nanocomposite Coatings on Rolling Element Bearings Tribol. Trans. 52 284 292 10.1080/10402000802369747 1:CAS:528:DC%2BD1MXhs1eqt7w%3D
12. JW Elam MD Groner SM George 2002 Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition Rev. Sci. Instrum. 73 2981 2987 10.1063/1.1490410 1:CAS:528:DC%2BD38Xls1Wjtr4%3D 2002RScI...73.2981E (Pubitemid 34946326)
13. JS Zabinski JH Sanders J Nainaparampil SV Prasad 2000 Lubrication Using a Microstructurally Engineered Oxide: Performance and Mechanisms Tribol. Lett. 8 103 116 10.1023/A:1019187202237 1:CAS:528:DC%2BD3cXns1Omur0%3D