SCOPUS 정보 검색 플랫폼

Volumn 204, Issue 12-13, 2010, Pages 1929-1932

Aperiodic W/B4C multilayer systems for X-ray optics: Quantitative determination of layer thickness by HAADF-STEM and X-ray reflectivity

(9) Haussler D a Morawe, Ch b Ross U a Ogut B a Spiecker, E a Jager W a Hertlein, F c Heidorn, U c Wiesmann, J c

a UNIVERSITY OF KIEL (Germany)

b EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

c Incoatec GmbH ^* (Germany)

Author keywords

Aperiodic multilayer systems; Geometric phase analysis (GPA); High angle annular dark field scanning transmission electron microscopy (HAADF STEM); TEM; X ray optical elements; X ray reflectivity measurements

Indexed keywords

GEOMETRIC PHASE ANALYSIS; HAADF-STEM; HIGH-ANGLE ANNULAR DARK FIELDS; MULTI-LAYER SYSTEM; SCANNING TRANSMISSION ELECTRON MICROSCOPY; TEM; X-RAY OPTICAL ELEMENTS; X-RAY REFLECTIVITY MEASUREMENTS;

BANDWIDTH; ELECTRIC FIELD MEASUREMENT; FILM PREPARATION; LIGHT TRANSMISSION; MICROSTRUCTURE; MULTILAYERS; OPTICAL DEVICES; OPTICAL MULTILAYERS; REFLECTION; SCANNING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAYS;

X RAY ANALYSIS;

EID: 76349099132 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.10.005 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.