Thin nanocrystalline diamond films deposited by LaPlas-CVD at atmospheric pressure

Production Engineering

Volumn 4, Issue 1, 2010, Pages 9-14

  Vollertsen, Frank ^a   Partes, Knut ^a   Schubnov, Alexej ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

Diamond coatings; Laser plasma CVD; Nanocrystalline diamond; Thin films

Indexed keywords

CUTTING FORCES; DIAMOND COATING; LASER PLASMA; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMOND THIN FILMS; NANOCRYSTALLINE DIAMONDS;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTALLITE SIZE; DIAMOND CUTTING TOOLS; DIAMOND FILMS; DIAMONDS; LASER BEAMS; LASER PRODUCED PLASMAS; NANOCRYSTALLINE ALLOYS; PLASMA INTERACTIONS; THIN FILMS;

DIAMOND DEPOSITS;

EID: 76049128350     PISSN: 09446524     EISSN: 18637353     Source Type: Journal    
DOI: 10.1007/s11740-009-0194-9     Document Type: Article

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