Synthesis of diamond coatings on tungsten carbide with photon plasmatron

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 302-307

  Schwarz, J ^a   Meteva, K ^a   Grigat, A ^a   Schubnov, A ^a   Metev, S ^a   Vollertsen, F ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

Atmospheric pressure; Diamond; Plasma CVD; Tungsten carbide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DIAMONDS; PHOTONS; PRESSURE MEASUREMENT; SURFACE ROUGHNESS; THIN FILMS; TUNGSTEN CARBIDE;

DEGREE OF EXCITATION; FILM DEPOSITION; PLASMA-CVD; PLASMATRONS;

COATINGS;

EID: 18444417132     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.10.008     Document Type: Conference Paper

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