An alternative process for the deposition of thin modified diamond coatings;Ein alternatives Verfahren zur Abscheidung von dünnen modifizierten Diamantschichten

Vakuum in Forschung und Praxis

Volumn 21, Issue 2, 2009, Pages 24-26

  Schubnov, Alexej ^a   Vollertsen, Frank ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATIVE PROCESS; CVD METHOD; DIAMOND COATING; FRICTION COEFFICIENTS; HIGH QUALITY; POLYCRYSTALLINE DIAMOND COATINGS; PROCESS CHAMBERS; STANDARD CONDITIONS;

ALUMINUM; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMOND CUTTING TOOLS; DIAMONDS; FRICTION; MOLYBDENUM;

TUNGSTEN CARBIDE;

EID: 67049108517     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200900376     Document Type: Article

References (5)

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3. Popov C., Novotny M., Jelinek M., Boycheva S., Vorlicek V., Trchova M., Kulisch W.: Chemical bonding study of nanocrystalline diamond films prepared by plasma techniques. Thin Solid Films 506- 507 (2006), 297-302
4. Kadlečíková M., Vojs M., Breza J., Veselý M., Frgala Z., Michalka M., Matějková J., Vojačková A., Daniš T., Marton M.: Microwave and hot filament chemical vapour deposition of diamond multilayers on Si and WC-Co substrates. Microelectronics Journal 38 (2007), 20-23
5. Schubnov A.: Diamantbeschichten von Sägebändern bei Atmosphärendruck mit Photonen-Plasmatron. Diamond business 4 (2006), 28-34, (ISSN 1619-5558)