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Volumn 518, Issue 10, 2010, Pages 2775-2778

Direct patterning of double-layered metal thin films by a pulsed Nd:YAG laser beam

Author keywords

Double layers; Metal thin film; Patterning; Pulsed laser

Indexed keywords

DIRECT-PATTERNING; DOUBLE LAYERS; ELASTIC FORCE; ELECTRICAL CONTACTS; ELECTRONIC DEVICE; GRAIN BOUNDARY REGIONS; METAL THIN FILM; METALLIC LAYERS; METALLIZATIONS; NANOSIZED GRAINS; ND-YAG LASERS; PATTERN FIDELITY; POLYCRYSTALLINE; PULSED LASER; PULSED ND:YAG LASER; SELECTIVE REMOVAL; SIMULATION RESULT; TECHNOLOGICAL SIGNIFICANCE;

EID: 76049098378     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.018     Document Type: Article
Times cited : (16)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.