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Applied Physics Letters

Volumn 85, Issue 13, 2004, Pages 2532-2534

Formation of silicon-on-diamond by direct bonding of plasma-synthesized diamond-like carbon to silicon

(6) Zhu, Ming a,c Chu, Paul K a Shi, Xuejie b Wong, Man b Liu, Weili c Lin, Chenglu c

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Hong Kong)

c SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ION CUTTING; PLASMA SYNTHESIS; SELF HEATING; SILICON-ON-DIAMOND (SOD) STRUCTURES;

CHEMICAL BONDS; DEPOSITION; DIAMOND LIKE CARBON FILMS; ELECTRIC INSULATION; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH TEMPERATURE EFFECTS; ION IMPLANTATION; PLASMA APPLICATIONS; RAPID THERMAL ANNEALING; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS; SURFACE TOPOGRAPHY; SYNTHESIS (CHEMICAL); THIN FILM TRANSISTORS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

SILICON WAFERS;

EID: 7544237925 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1799242 Document Type: Article

Times cited : (18)

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