Effect of N2 addition in Ar plasma on the development of microstructure of ultra-nanocrystalline diamond films

Diamond and Related Materials

Volumn 19, Issue 2-3, 2010, Pages 147-152

  Wang, Chuan Sheng ^a,b   Tong, Ging Horng ^a   Chen, Huang Chin ^a   Shih, Wen Ching ^c   Lin, I Nan ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

^b TECHNOLOGY AND SCIENCE INSTITUTE OF NORTHERN TAIWAN   (Taiwan)

^c TATUNG UNIVERSITY   (Taiwan)

Author keywords

N2 Ar plasma; TEM; UNCD

Indexed keywords

AR PLASMAS; DIAMOND GRAINS; ELECTRON FIELD EMISSION; ELONGATED GRAINS; OPTICAL EMISSIONS; SPECTROSCOPIC INVESTIGATIONS; SPHERICAL DIAMOND; TEM; TURN-ON FIELD; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRA-SMALL;

ARGON; DIAMOND FILMS; DIAMONDS; FIELD EMISSION; GRAIN BOUNDARIES; MICROSTRUCTURE;

PLASMAS;

EID: 74849102591     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.09.009     Document Type: Article

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