Homogeneous Al2O3 multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation

Scripta Materialia

Volumn 62, Issue 7, 2010, Pages 447-450

  Choi, Yun Hyuk ^a   Lee, Young Gu ^a   Bulliard, Xavier ^a   Lee, Kwang Hee ^a   Lee, Sangyoon ^a   Choi, Dukhyun ^a   Park, Jong Jin ^a   Kim, Jong Min ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Amorphous oxides; Gas barrier; Internal stresses; Multilayer thin films; Sputtering

Indexed keywords

AMORPHOUS OXIDES; GAS BARRIER; INTERNAL STRESS; MULTI-LAYER THIN FILM; MULTILAYER THIN FILMS;

ALUMINUM; AMORPHOUS FILMS; FILM PREPARATION; MECHANICAL STABILITY; MULTILAYER FILMS; MULTILAYERS; SYSTEM STABILITY; WATER VAPOR;

GAS PERMEABLE MEMBRANES;

EID: 74749085859     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2009.12.006     Document Type: Article

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