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Physica B: Condensed Matter

Volumn 404, Issue 23-24, 2009, Pages 4731-4734

Microstructural and magnetic study of Fe-implanted 6H-SiC

(8) Dupeyrat, C a Declemy A a Drouet, M a Eyidi, D a Thome L b Debelle, A b Viret, M c Ott, F d

a SP2MI (France)

b UNIVERSITÉ PARIS SACLAY (France)

c SERVICE DE PHYSIQUE DE L ETAT CONDENSÉ (France)

d CEA SACLAY (France)

Author keywords

[No Author keywords available]

Indexed keywords

DILUTED MAGNETIC SEMICONDUCTORS; IRON COMPOUNDS; MAGNETIC SEMICONDUCTORS; MAGNETISM; METAL RECOVERY; RAPID THERMAL ANNEALING; SILICON COMPOUNDS; WIDE BAND GAP SEMICONDUCTORS;

DIFFERENT TREATMENTS; IMPLANTATION INDUCED DAMAGES; LASER PROCESS; MAGNETIC STUDIES; MICRO-STRUCTURAL; RAPID THERMAL ANNEALING (RTA); SIC MATRIXES; SINGLE-CRYSTALLINE;

SILICON CARBIDE;

EID: 74449093888 PISSN: 09214526 EISSN: None Source Type: Journal
DOI: 10.1016/j.physb.2009.08.125 Document Type: Article

Times cited : (23)

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