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Volumn 404, Issue 23-24, 2009, Pages 4758-4760
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Influence of the defect density (twins boundaries) on electrical parameters of 3C-SiC epitaxial films
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Author keywords
3C SiC; Magnetoresistance; Mobility; Twins; X ray
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Indexed keywords
3C-SIC;
4H-SIC SUBSTRATE;
DOPING LEVELS;
ELECTRICAL PARAMETER;
LOW-TEMPERATURE CONDUCTIVITY;
SIC SUBSTRATES;
STRUCTURAL PERFECTION;
SUBLIMATION EPITAXY;
TRANSITION REGIONS;
CRYSTAL GROWTH;
DEFECT DENSITY;
ELECTRIC RESISTANCE;
EPITAXIAL FILMS;
EPITAXIAL LAYERS;
MAGNETIC FIELD EFFECTS;
MAGNETOELECTRONICS;
MAGNETORESISTANCE;
OPTICAL ENGINEERING;
SILICON CARBIDE;
SUBSTRATES;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 74449088872
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2009.08.183 Document Type: Article |
Times cited : (13)
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References (6)
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