Advanced processes for MEMS-based displays

AD'07 - Proceedings of Asia Display 2007

Volumn 1, Issue , 2007, Pages 107-112

  Londergan, Ana ^a   Gousev, Evgeni ^a   Chui, Clarence ^a  

^a QUALCOMM INC   (United States)

Author keywords

ALD; IMoD; MEMS displays; Nanoengineering; Reflective displays

Indexed keywords

ADVANCED MATERIALS; ADVANCED PROCESS; ALD; CURRENT STATUS; FOUNDARY; FUTURE TECHNOLOGIES; IMOD; INNOVATION CENTERS; LOW POWER; MANUFACTURING ENGINEERING; MEMS TECHNOLOGY; NANO-ENGINEERING; QUALCOMM; REFLECTIVE DISPLAY; RESEARCH ACTIVITIES; SAN JOSE , CALIFORNIA;

INDUSTRIAL RESEARCH; MANUFACTURE; PRODUCT DEVELOPMENT; TECHNOLOGY;

INNOVATION;

EID: 74249121264     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

1. J. B. Sampsell, MEMS-Based Display Technology Drives Next-Generation FPDs for Mobile Applications, Information Display, Vol.22, No. 6, 2006, pp. 24-28.
2. P. D. Floyd et al., iMoD Display Manufacturing, Proc. SID, Vol.37, 2006, pp. 1980-1983.
3. B. J. Gaily et al., Wide-Gamut Color Reflective Displays Using iMoD Interference Technology, Proc. SID, Vol.35, 2004, pp.654-657.
4. A. T. Voutsas, Poly-Si TFT Technology: Advances in Material, Process and Device Technology, ECS Transactions, Vol. 3, No. 8, 2006, p. 157.
5. K. Murata et al., Development of ALD/PECVD Reactor for High Quality LTPS-TFTs Insulator, ECS Transactions, Vol. 3, No. 8, 2006, pp. 101 -106.
6. M. Ritala and M. Leskela, Atomic Layer Deposition, Chapter 2 in Handbook of Thin Film Materials, Vol. 1, Academic Press, 2002, p. 103.
7. Atomic Layer Deposition Applications II, Eds. A. R. Londergan et al., ECS Transactions, Vol. 3, 2007.
8. M. Gutsche et al., Capacitance enhancement techniques for sub-100 nm trench DRAMs, IEDM Tech. Dig., 2001, p. 411.
9. R. M. Wallace and G. D. Wilk, High-k dielectric materials for microelectronics, Critical Reviews in Solid State and Materials Sciences, Vol. 28, 2003, pp.231 -285.
10. Wei Xiong et al., Ultra-thin ALD Alumina Reader Gaps for High Density Recording Heads, MMM Conf. 2001, Session HP-03.
11. Y.-J. Changa et al., Atomic Layer Deposited Films for Micro-and Nano-scale Electro-Mechanical Systems, in[7].
12. D. B. Farmera et al., ALD of High-k Dielectrics on Suspended Functionalized SWNTs, Electrochem-ical and Solid-State Letters, Vol. 8, No. 4, 2005, G89 - G91.
13. A. P. Ghosh et al., Thin-film encapsulation of organic light-emitting devices, Appl. Phys. Lett, 86, 2005, 223503.
14. S.-H. Ko Park et al., Ultrathin Film Encapsulation of an OLED by ALD, Electrochemical and Solid-State Letters, Vol. 8, No. 2, 2005, H21 - H23.