Effects of Sr/Ti ratio on the step coverage of SrTiO3 thin films fabricated using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 A, 2001, Pages 2456-2459

  Soon Yon Park, ^a   Choi, J ^a   No, K ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Composition; Flow rate; MOCVD; SrTiO3; Step coverage

Indexed keywords

CARRIER MOBILITY; DIELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS;

PRECURSOR VAPORS; STEP COVERAGE;

THIN FILMS;

EID: 0035302008     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.2456     Document Type: Article

References (14)