Thermal stability of RuO2/Ru bilayer thin film in oxygen atmosphere

Thin Solid Films

Volumn 359, Issue 1, 2000, Pages 118-123

  Oh, Sang Ho ^b   Park, Chan Gyung ^a   Park, Chanro Park ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; FERROELECTRIC MATERIALS; FILM PREPARATION; MAGNETRON SPUTTERING; OXIDATION; RUTHENIUM COMPOUNDS; THERMODYNAMIC STABILITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DIFFUSION BARRIERS;

DIELECTRIC FILMS;

EID: 0033877078     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00700-2     Document Type: Article

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