Plasma enhanced CVD of SiO x C y H z thin film on different textile fabrics: Influence of exposure time on the abrasion resistance and mechanical properties

Applied Surface Science

Volumn 256, Issue 8, 2010, Pages 2509-2516

  Rosace, Giuseppe ^a   Canton, Roberto ^b   Colleoni, Claudio ^a  

^a UNIVERSITY OF BERGAMO   (Italy)

^b POINT   (Italy)

Author keywords

Abrasion resistance; Hexamethyldisiloxane; Mechanical properties; Plasma polymerization; Textile fabric

Indexed keywords

ABRASION; CHEMICAL BONDS; INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; SILICON COMPOUNDS; TEXTILE FIBERS; TEXTILE FINISHING; TEXTILE INDUSTRY; TEXTILES; THIN FILMS; TRIBOLOGY; WEAVING;

CHEMICAL VAPOUR DEPOSITION; ELECTRON SCANNING MICROSCOPIES; ELEMENTAL COMPOSITIONS; ENERGY DISPERSIVE X-RAY; HEXAMETHYL DISILOXANE; PERFORMANCE PROPERTIES; POLYMERIZATION PROCESS; TEXTILE FABRIC;

WEAR RESISTANCE;

EID: 74149094665     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.10.097     Document Type: Article

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