Rapid initiation of reactions in Al/Ni multilayers with nanoscale layering

Journal of Physics and Chemistry of Solids

Volumn 71, Issue 2, 2010, Pages 84-89

  Morris, Christopher J ^a   Mary, Brian ^a   Zakar, Eugene ^a   Barron, Sara ^b   Fritz, Greg ^b   Knio, Omar ^b   Weihs, Timothy P ^b   Hodgin, Ralph ^c   Wilkins, Paul ^c   May, Chadd ^c  

^a U S ARMY RESEARCH LABORATORY   (United States)

^b Johns Hopkins University   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

A. Intermetallic compounds; A. Thin films; B. Plasma deposition; Multilayers

Indexed keywords

A. INTERMETALLIC COMPOUNDS; A. THIN FILMS; B. PLASMA DEPOSITION; BI-LAYER; ELECTRICAL CURRENT; ELECTRICAL ENERGY; ELECTRONICS FABRICATION; ENERGY OUTPUT; FLYER PLATES; INTERMETALLIC COMPOUNDS; INTERMETALLIC REACTION; LOCAL HEATING; NANO LAYERS; NANO SCALE; NANOENERGETIC MATERIALS; NI-AL INTERMETALLICS; RATE OF HEAT RELEASE; TIME-SCALES; UNIFORM HEATING;

ALUMINUM; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM PREPARATION; HEATING; KINETIC ENERGY; MULTILAYER FILMS; NANOSTRUCTURED MATERIALS; PLASMA DEPOSITION; REACTION RATES; SEMICONDUCTING INTERMETALLICS;

MULTILAYERS;

EID: 74149093422     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2009.07.026     Document Type: Article

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