Field emission characteristics of carbon nanotubes post-treated with high-density Ar plasma

Applied Surface Science

Volumn 256, Issue 7, 2010, Pages 2184-2188

  Wang, Wen Pin ^a   Wen, Hua Chiang ^b   Jian, Sheng Rui ^c   Cheng, Huy Zu ^c   Jang, Jason Shian Ching ^d   Juang, Jenh Yih ^a   Cheng, Huang Chung ^a   Chou, Chang Pin ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHIN YI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^c I SHOU UNIVERSITY   (Taiwan)

^d NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Field emission property; Multi walled carbon nanotube; Scanning electron microscopy; Transmission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; ELECTRONS; FIELD EMISSION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INDUCTIVELY COUPLED PLASMA; PLASMA APPLICATIONS; PLASMA THEORY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; YARN;

ELECTRIC CHARACTERISTICS; EMISSION CURRENT DENSITY; EMISSION ENHANCEMENT; FIELD EMISSION PROPERTY; FIELD-EMISSION CHARACTERISTICS; GEOMETRICAL STRUCTURE; INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING; THERMAL CHEMICAL VAPOR DEPOSITION;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 74149090262     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.09.070     Document Type: Article

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