N-type TiO2 thin films for electrochemical ozone production

Journal of the Electrochemical Society

Volumn 157, Issue 2, 2010, Pages

  Kitsuka, Kenta ^a,b   Kaneda, Kazuhiro ^a   Ikematsu, Mineo ^a   Iseki, Masahiro ^a   Mushiake, Katsuhiko ^a   Ohsaka, Takeo ^b  

^a SANYO ELECTRIC CO LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC BIAS; DEEP DEPLETION; ELECTROCHEMICAL OZONE PRODUCTIONS; HIGH CURRENTS; HIGH EFFICIENCY; LOW CURRENT DENSITY; N-TYPE SEMICONDUCTORS; PHOTOELECTROCHEMICAL MEASUREMENTS; SOLUTION INTERFACE; TIO; UV PHOTOELECTRON SPECTROSCOPY; UV VISIBLE SPECTROSCOPY;

ELECTROCATALYSIS; FILM THICKNESS; OXIDE MINERALS; OZONE; OZONE LAYER; PLATINUM; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 73849117488     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3265469     Document Type: Article

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