Ozone generation by a TaOx and Pt composite insulator-coated Ti electrode

Electrochemical and Solid-State Letters

Volumn 8, Issue 6, 2005, Pages

  Kaneda, Kazuhiro ^a   Ikematsu, Mineo ^a   Koizumi, Yurika ^a   Minoshima, Haruki ^a   Rakuma, Tsuyoshi ^a   Takaoka, Daizo ^a   Yasuda, Masashi ^a  

^a SANYO ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; COATINGS; CONCENTRATION (PROCESS); ELECTRIC INSULATORS; ELECTRODES; PLATINUM; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; TANTALUM COMPOUNDS; TITANIUM; X RAY DIFFRACTION ANALYSIS;

CATALYST LAYERS; ELECTRONIC TRANSFER; MOLAR CONCENTRATION; OZONE GENERATION;

OZONE;

EID: 20844442984     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1904467     Document Type: Article

References (21)

1. D. J. Kjos, R. R. Furgason, and L. L. Edwards, in Proceedings of the First International Ozone Symposium, p. 194 (1975).
2. Y. Kondo, K. Ikegami, M. Iseki, D. Takaoka, and K. Takizawa, Bokin Bobai, 32, 1 (2004).
3. P. Pichet and C. Hurtubise, in Proceedings of the Second International Symposium on Ozone Technology, p. 664 (1975).
4. T. Ozawa, H. Yotsumoto, T. Kobayashi, H. Kawahara, H. Ono, and H. Horiike, in Proceedings of the 10th Ozone World Congress, p. 471 (1991).
5. W. S. Otwell, N. Blake, D. E. Sweat, R. G. Rice, R. Marschalk, and J. Farquhar, in Proceedings of the 7th Ozone World Congress, p. 271 (1985).
6. A. P. Black and R. F. Christman, J. Am. Water Works Assoc., 55, 7, 897 (1963).
7. S. Nakayama, K. Esaki, K. Namba, Y. Taniguchi, and N. Tabala, Ozone: Sci. Eng., 1, 119 (1979).
8. H. Taube, Trans. Faraday Soc., 53, 656 (1959).
9. N. Abe, K. Fujino, and Y. Ban, J. Electrochem. Soc., 134, 2041 (1987).
10. H. Suzuki, T. Murashima, K. Shimizu, and K. Tsukamoto, Chem. Lett., 1991, 817.
11. Y. Kawaai, J. Hirotsuji, A. Ikeda, and S. Nakayama, in Proceedings of the 12th IOA World Congress, p. 279 (1995).
12. J. K. Tong, D. C. Grant, and C. A. Peterson, in Proceedings of the 2nd International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, p. 18 (1990).
13. D. H. Volman, J. Phys. Chem., 21, 2086 (1953).
14. G. Herzberg, Can. J. Phys., 30, 185 (1952).
15. J. C. Devins, J. Electrochem. Soc., 103, 460 (1956).
16. S. Sluckt, G. Thesis, R. Kotz, and H. J. Christen, J. Electrochem. Soc., 132, 367 (1985).
17. P. C. Fuller and C. W. Tobias, J. Electrochem. Soc., 129, 506 (1982).
18. M. Miles, E. Claus, B. Gunn, J. Locker, and W. Serafin, Electrochim. Acta, 23, 521 (1978).
19. Y. Kamegaya, K. Sasaki, M. Oguri, T. Asaki, H. Kobayashi, and T. Mitamura, Electrochim. Acta, 40, 889 (1995).
20. G. N. Martelli, R. Ornelas, and G. Faita, Electrochim. Acta, 39, 1551 (1994).
21. D. Stauffer, Introduction to Percolation Theory, Taylor & Francis, London (1985).