Improved photoreaction yields for soft ultraviolet photolithography in organothiol self-assembled monolayers

Journal of Physical Chemistry C

Volumn 113, Issue 52, 2009, Pages 21642-21647

  Prompinit, Panida ^a   Achalkumar, Ammathnadu S ^a   Han, Xiaojun ^a   Bushby, Richard J ^a   Wälti, Christoph ^a   Evans, Stephen D ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACID CATALYSIS; COVALENT ATTACHMENT; DIRECT IRRADIATION; FUNCTIONALIZED SURFACES; HIGH YIELD; HINDERED ALCOHOLS; ISO-PROPANOLS; METHYL ESTERS; PATTERNED SURFACE; PHOTOPATTERNED; PHOTOREACTIONS; SAMS; ULTRAVIOLET PHOTOLITHOGRAPHY;

CARBOXYLIC ACIDS; CATALYSIS; ESTERIFICATION; ESTERS; IRRADIATION; ORGANIC ACIDS; ORGANIC POLYMERS; PHOTOLYSIS;

SELF ASSEMBLED MONOLAYERS;

EID: 73849088701     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp907950c     Document Type: Article

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