Chemically functionalized carbon nanosieves with 1-nm thickness

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Volumn 5, Issue 23, 2009, Pages 2651-2655

  Schnietz, Mark ^a   Turchanin, Andrey ^a   Nottbohm, Christoph T ^a   Beyer, André ^a   Solak, Harun H ^b   Hinze, Peter ^c   Weimann, Thomas ^c   GOlzhauser, Armin ^a  

^a BIELEFELD UNIVERSITY   (Germany)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Nanobiomaterials; Nanolithography; Nanomembranes; Nanosieves; Self assembled monolayers

Indexed keywords

EXTREME UV; FUNCTIONALIZED; INTERFERENCE LITHOGRAPHY; NANOBIOMATERIALS; NANOMEMBRANES; NANOPATTERNING;

NANOLITHOGRAPHY; NANOSTRUCTURES; PHOTOLITHOGRAPHY;

SELF ASSEMBLED MONOLAYERS;

CARBON NANOTUBE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ULTRASTRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; NANOTECHNOLOGY; NANOTUBES, CARBON; PHOTOELECTRON SPECTROSCOPY;

EID: 73349124223     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200901283     Document Type: Article

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