Near neighbor averaging: A technique for improving image uniformity in aperture array lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2674-2678

  Nasrullah, A ^a   Smith, D ^a   Sherlock, T ^a   Ruchhoeft, P ^a   Litvinov, D ^a,b  

^a UNIVERSITY OF HOUSTON   (United States)

^b University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APERTURE ARRAYS; BEAMLETS; DENSE ARRAYS; IMAGE UNIFORMITY; ION BEAM APERTURES; LARGE ARRAYS; MASK FABRICATION; MASSIVE ARRAYS; PERIODIC PATTERN; RANDOM DEFECTS; SQUARE ROOTS; STANDARD DEVIATION; STENCIL MASKS; WAFER SURFACE;

ION BEAMS; MASKS;

IONS;

EID: 72849112422     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3265462     Document Type: Conference Paper

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