Facile synthesis of well-defined pH-Liable schiff-base-type photosensitive polymers via visible-light-activated ambient temperature RAFT polymerization

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 47, Issue 23, 2009, Pages 6668-6681

  Luo, Qing ^a   Zheng, Haimei ^a   Peng, Ye ^a   Gao, Huan ^a   Lu, Lican ^a   Cai, Yuanli ^a  

^a XIANGTAN UNIVERSITY   (China)

Author keywords

Biomimetic; Photopolymerization; Photosensitive polymer; Reversible addition fragmentation chain transfer (RAFT); Visible light

Indexed keywords

AMBIENT TEMPERATURES; DITHIOESTERS; ELECTRON-DONATING; ELECTRONWITHDRAWING; ETHYL METHACRYLATES; FACILE SYNTHESIS; FEED MOLAR RATIO; FLUORESCENCE BEHAVIORS; GLYCIDYL METHACRYLATE; MOLECULAR MECHANISM; NATURAL RHODOPSINS; PH-RESPONSIVE; PHOTO-SENSORS; PHOTOSENSITIVE POLYMERS; POLYMERIZATION RATES; PROTONATING; RAFT POLYMERIZATION; RANDOM COPOLYMERIZATION; REACTIVITY RATIO; REVERSIBLE ADDITION FRAGMENTATION CHAIN TRANSFER; SCHIFF-BASE; STRUCTURE CHARACTER; VISIBLE LIGHT; WEAK ABSORPTION;

ACRYLIC MONOMERS; AMINATION; AMINES; BIOMIMETICS; CHAINS; CHROMOPHORES; FLUORESCENCE; FLUORINE CONTAINING POLYMERS; FREE RADICAL POLYMERIZATION; FUNCTIONAL GROUPS; GAS METAL ARC WELDING; LIGHT MODULATORS; LIGHT SENSITIVE MATERIALS; LIVING POLYMERIZATION; MONOMERS; ORGANIC POLYMERS; PHOTOPOLYMERIZATION; PHOTORESISTS; PHOTOSENSITIVITY; POLYMERS; POLYMETHYL METHACRYLATES; QUENCHING; SYNTHESIS (CHEMICAL); TEMPERATURE;

FUNCTIONAL POLYMERS;

EID: 72449193630     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.23708     Document Type: Article

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