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Volumn , Issue , 2009, Pages 132-135
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RF degradation of GaN HEMTs and its correlation with DC stress and I-DLTS measurements
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Author keywords
[No Author keywords available]
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Indexed keywords
DC OPERATION;
DC STRESS;
DEVICE PERFORMANCE;
DLTS;
GAN HEMTS;
GATE CONTACT;
GATE TERMINALS;
LOCALIZED DEFECTS;
OUTPUT POWER;
PHYSICAL MECHANISM;
REVERSE BIAS;
REVERSE CURRENTS;
REVERSE GATE;
RF STRESS;
STRONG CORRELATION;
THERMALLY ACTIVATED;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
DEFECTS;
DEGRADATION;
ELECTRIC CURRENT MEASUREMENT;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
HIGH ELECTRON MOBILITY TRANSISTORS;
INTEGRATED CIRCUITS;
MICROWAVE INTEGRATED CIRCUITS;
MICROWAVES;
SEMICONDUCTING GALLIUM;
DRAIN CURRENT;
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EID: 72449142096
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (26)
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References (6)
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