Highly efficient photoluminescence of Er2SiO5 films grown by reactive magnetron sputtering method

Journal of Luminescence

Volumn 130, Issue 3, 2010, Pages 411-414

  Zheng, J ^a   Ding, W C ^a   Xue, C L ^a   Zuo, Y H ^a   Cheng, B W ^a   Yu, J Z ^a   Wang, Q M ^a   Wang, G L ^b   Guo, H Q ^b  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b HUAQIAO UNIVERSITY   (China)

Author keywords

Erbium silicate; Photoluminescence; Si photonics

Indexed keywords

ANNEALING TREATMENTS; AS-DEPOSITED FILMS; CONCENTRATION OF; CRYSTALLINE STRUCTURE; EMISSION INTENSITY; PHOTON FLUX; PL INTENSITY; POWER DEPENDENCE; REACTIVE MAGNETRON SPUTTERING METHOD; RUTHERFORD BACK-SCATTERING; SCANNING ELECTRON MICROSCOPE; SI PHOTONICS; SI SUBSTRATES; SI-BASED; TEMPERATURE-DEPENDENT PHOTOLUMINESCENCE; THERMAL QUENCHING; THERMAL TREATMENT; UP-CONVERSION; X-RAY DIFFRACTION MEASUREMENTS;

LIGHT; LIGHT SOURCES; MAGNETRONS; PHOTOLUMINESCENCE; QUENCHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICATES; SILICON;

ERBIUM;

EID: 72149103535     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2009.10.005     Document Type: Article

References (15)

1. Fujii M., Yoshida M., Kanzawa Y., Hayashi S., and Yamamoto K. Appl. Phys. Lett. 71 (1997) 1198
2. Franzo G., Pecora E., Priolo F., and Iacona F. Appl. Phys. Lett. 90 (2007) 183,102
3. Ding W.C., Hu D., Zheng J., Chen P., Cheng B.W., Yu J.Z., and Wang Q.M. J. Phys. D: Appl. Phys. 41 (2008) 135,101
4. Wang S., Eckau A., Neufeld E., Carius R., and Buchal Ch. Appl. Phys. Lett. 71 (1997) 2824
5. Saini S., Chen K., Duan X.M., Michel J., Kimerling L.C., and Lipson M. J. Electron. Mater. 33 (2004) 809-814
6. Miritello M., Lo Savio R., Piro A.M., Franzo G., Priolo F., Iacona F., and Bongiorno C. J. Appl. Phys. 100 (2006) 013,502
7. Isshiki H., and Kimura T. IEICE Trans. Electron. E91-C2 (2008) 138
8. Miritello M., Lo Savio R., Iacona F., Franzo G., Irrera A., Piro A.M., Bongiorno C., and Priolo F. Adv. Mater. 19 (2007) 1582-1588
9. Masaki K., Isshiki H., and Kimura T. Opt. Mater. 27 (2005) 876
10. Kimura T., Masaki K., and Isshiki H. J. Lumin. 121 (2006) 226-229
11. Tadamasa K., Tanaka Y., Ueda H., and Isshiki H. Physica E 41 (2009) 1063-1066
12. Wang X.X., Zhang J.G., Cheng B.W., Yu J.Z., and Wang Q.M. J. Cryst. Growth 289 (2006) 178
13. Suh K., Shin J.H., Seok-Jun S., and Bae B.-S. Appl. Phys. Lett. 89 (2006) 223,102
14. Felsche J. Struct. Bonding 13 (1973) 99
15. Priolo F., Franz′o G., Coffa S., and Carnera A. Phys. Rev. B 57 (1998) 4443