SCOPUS 정보 검색 플랫폼

Volumn 289, Issue 1, 2006, Pages 178-182

Enhancement of 1.53 μm photoluminescence from spin-coated Er-Si-O (Er2SiO5) crystalline films by nitrogen plasma treatment

(5) Wang, X X a Zhang, J G a Cheng, B W a Yu, J Z a Wang, Q M a

a INSTITUTE OF SEMICONDUCTORS (China)

Author keywords

A1. Photoluminescence; A3. Spin coating; B1. Rare earth compounds

Indexed keywords

ANNEALING; ERBIUM COMPOUNDS; NITROGEN; PHOTOLUMINESCENCE; PLASMAS; RARE EARTH COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPIN COATING; THIN FILMS; X RAY DIFFRACTION;

EXCITATION/EMISSION CROSS-SECTION; NITROGEN PLASMA TREATMENT; RUTHERFORD BACKSCATTERING MEASUREMENT;

CRYSTALLINE MATERIALS;

EID: 33244480324 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.10.142 Document Type: Article

Times cited : (21)

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