Depth profiled XPS analysis of a polymerized silicon-carbon thin film

Plasma Chemistry and Plasma Processing

Volumn 29, Issue 6, 2009, Pages 559-566

  Scott, Paul R ^a   Wieliczka, David M ^a   Kruger, Michael B ^a  

^a UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

Author keywords

Aluminum; Carbon; Corrosion protection; PECVD; Plasma polymerization; PVD; Silicon; Trimethylsilane; XPS

Indexed keywords

ALUMINUM SUBSTRATE; BI-LAYER; CARBON CORROSION; CARBON THIN FILMS; DEPOSITED FILMS; IN-SITU STUDY; PVD; TRIMETHYLSILANE; X RAY PHOTOELECTRON SPECTRA; XPS; XPS ANALYSIS;

ALUMINUM; CHEMICAL PROPERTIES; CORROSION; CORROSION PROTECTION; PLASMA DEPOSITION; PLASMA POLYMERIZATION; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; THIN FILM DEVICES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 72149100169     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-009-9197-8     Document Type: Article

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