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Volumn 48, Issue 7 PART 2, 2009, Pages

Elastic-constant measurement in oxide and semiconductor thin films by Brillouin oscillations excited by picosecond ultrasound

(6) Ogi, Hirotsugu a Shagawa, Tomohiro a Nakamura, Nobutomo a Hirao, Masahiko a Odaka, Hidefumi a,b Kihara, Naoto a,b

a OSAKA UNIVERSITY (Japan)

b ASAHI GLASS CO LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICA; BRILLOUIN OSCILLATIONS; DIAMOND THIN FILM; FEMTOSECOND LIGHT PULSE; OSCILLATION FREQUENCY; PICOSECONDS; PROBE LIGHT; REFLECTIVITY CHANGES; SEMICONDUCTOR THIN FILMS; STIFFNESS MEASUREMENTS; STRAIN PULSE; TANTALUM OXIDES; THEORETICAL CALCULATIONS;

ACOUSTIC WAVES; AMORPHOUS SILICON; DIAMOND FILMS; ELASTIC CONSTANTS; LIGHT TRANSMISSION; OXIDE FILMS; PROBES; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; STIFFNESS; TANTALUM; TANTALUM COMPOUNDS; THIN FILMS; ULTRASONICS;

AMORPHOUS FILMS;

EID: 72049090384 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.07GA01 Document Type: Article

Times cited : (17)

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