Properties of Ta2O5 thin films deposited by DC reactive magnetron sputtering

International Journal of Modern Physics B

Volumn 23, Issue 27, 2009, Pages 5275-5282

  Zhou, Jicheng ^a   Luo, Ditian ^a   Li, Youzhen ^a   Liu, Zheng ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

DC reactive magnetron sputtering; Optical properties; Oxygen flow ratio; Ta2O5 thin film

Indexed keywords

EID: 71949095117     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217979209053618     Document Type: Article

References (12)

1. F. E. Ghodsi, Z. Fatma et al., Thin Solid Films 295, 11 (1997).
2. C. Chaneliere, J. L. Autran, R. A. B. Devine et al., Mater. Sci. Eng. R22, 269 (1998).
3. F. E. Ghodsi, Z. Fatma et al., Solar Energy Mater. Solar Cells 59, 367 (1999).
4. J. S. Lee, S. J. Chang, J. F. Chen et al., Mater. Chem. Phys. 77(1), 242 (2003).
5. E. Atanassova and D. Spasov, Microelectron. Reliability 42(8), 1171 (2002).
6. D. J. Werder and R. R. Kola, Thin Solid Films 323(1-2), 6 (1998).
7. I. Porqueras, J. Marti and E. Bertran, Thin Solid Films 343-344, 449 (1999).
8. C. C. Lee and D. J. Jan, Thin Solid Films 483, 130 (2005).
9. J. C. Manifacier, J. Gasiot and J. P. Fillard, J. Phys. E: Sci. Instrum. 9, 1002 (1976).
10. R. Swanepoel, J. Phys. E: Sci. Instrum. 16, 1214 (1983).
11. E. Marquez, J. Ramirez-Malo, P. Villares et al., J. Phys. D: Appl. Phys. 25, 535 (1992).
12. E. Franke, M. Schubert, C. L. Trimble et al., Thin Solid Films 388, 283 (2001).