Effect of phonon interactions on limiting the f.Q product of micromechanical resonators

TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2009, Pages 2131-2134

  Tabrizian, R ^a   Rais Zadeh, M ^b   Ayazi, F ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Akheiser regime; Attenuation coefficient; f.Q product; Landau Rumer regime; Phonon interaction; Q; Resonator; Ultrasonic absorption

Indexed keywords

ATTENUATION COEFFICIENT; CRYSTALLINE ORIENTATIONS; F.Q PRODUCT; LINEAR FUNCTIONS; LOWER FREQUENCIES; MATERIAL PROPERTY; MICRO RESONATORS; MICROMECHANICAL RESONATOR; PHONON INTERACTIONS; PHONON RELAXATION; SILICON RESONATORS; UPPER LIMITS;

ABSORPTION; ACOUSTIC RESONATORS; ACTUATORS; MICROSYSTEMS; PHONONS; PIEZOELECTRIC TRANSDUCERS; RESONATORS; ULTRASONIC ABSORPTION; ULTRASONICS;

SOLID-STATE SENSORS;

EID: 71449116454     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2009.5285627     Document Type: Conference Paper

References (19)

1. S. A. Chandorkar, et al., "Limits of quality factor in bulk-mode micromechanical resonators," Proc. IEEE MEMS, Tucson, AZ, Jan. 2008, pp. 74-77.
2. V. B. Braginsky, et al., Systems with Small Dissipation, The University of Chicago Press, 1985.
3. Z. Hao, A. Erbil, and F. Ayazi, "An Analytical Model for Support Loss in Micromachined Beam Resonators with In-plane Flexural Vibrations," Sensors and Actuators A, vol. 109, Dec. 2003, pp. 156-164.
4. rd ed., 1986.
5. A. Akheiser, J . Phys. USSR, pp. 1277, 1939.
6. T. O. Woodruff and H. Ehrenreich, "Absorption of sound in insulators," Phys. Rev., pp. 1553-1559, Sep. 1961.
7. L. Landau and G. Rumer, Phys. Z. Sowjetunion 11, 18, 1937.
8. Y. Shapira, B. Fisher, B. Pratt, and A. Many, "Measurements of acoustoelectric gain and lattice attenuation in n-GaAs," J. Phys. C: Solid State Phys. vol. 5, pp. 3477-3490, 1972.
9. C. Zener, Elasticity and Anelasticity of Metals, The University of Chicago Press, Chicago, Illinois, 1948.
10. J. F. Rosenbaun, Bulk acoustic wave theory and devices, Artec House, Boston-London, 1988.
11. Yu. A. Logachev and Fiz. Tverd. Tela, Sov. Phys. Solid State, vol. 16, pp. 2008, 1975.
12. Y. V. Ilisavskii and V. M. Sternin, Sov. Phys. Solid State, vol. 27, pp. 236-239, February 1985.
13. J. Hasson and A. Many, "Observation of Akhiezer and Landau-Rumer regions in the frequency dependence of shear-wave lattice attenuation in CdS," Phys. Review Letters, v. 35, pp. 792-795, Sept. 1975.
14. st Int. Symposium on Laser Ultrasonics: Science, Technology and Applications, July 2008, Montreal, Canada.
15. S. D. Lambade, G. G. Sahasrabudhe, and S. Rajagopalan, "Temperature dependence of acoustic attenuation in silicon," Physical Review B, Vol. 51, no. 22, pp. 861-866, 1995.
16. I. S. Didenko, F. S. Hickernell, and N. F. Naumenko, "The experimental and theoretical characterization of the SAW propagation properties for zinc oxide films on silicon carbide," IEEE Trans. on Ultrasonics, Ferroelectrics, and Frequency Control, vol. 47, pp. 179-187, Jan. 2000.
17. I. G. Kuleyev, I. I. Kuleyev, A. P. Tankeyev, and I. Yu. Arapova, "Landau-Rumer relaxation mechanism of the thermal and high-frequency phonons in cubic crystals," phys. stat. sol. (c) 1, no. 11, pp. 2963-2966, 2004
18. J. Wang, J. E. Butler, T. Feygelsonand, and C. T.-C. Nguyen, "1.51-GHz nanocrystalline diamond micromechanical disk resonator with material-mismatched isolating support," in Proc. IEEE Int. Conf. MEMS, 2004, pp. 731-734.
19. H. M. Lavasani, A. K. Samarao, G. Casinovi, and F. Ayazi, "A 145MHz low phase-noise capacitive silicon micromechanical oscillator," Proc. IEEE IEDM, San Francisco, CA, Dec. 2008.