Study on contamination of projection optics surface for extreme ultraviolet lithography

Applied Surface Science

Volumn 256, Issue 4, 2009, Pages 1171-1175

  Koida, Keigo ^a   Niibe, Masahito ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Carbon deposition; Contamination; EUVL; Lifetime acceleration test; Multilayer mirror; Ru

Indexed keywords

CONTAMINATION; ETHANOL; EXTREME ULTRAVIOLET LITHOGRAPHY; IRRADIATION; MIRRORS; MULTILAYERS; OPTICAL TESTING; REFLECTION; RUTHENIUM; WATER VAPOR;

ACCELERATION TESTS; CARBON DEPOSITION; MO/SI MULTILAYER; MULTI-LAYER MIRRORS; PRESENCE OF WATER; PROJECTION OPTICS; REFLECTIVITY CHANGES; SURFACE OXIDATIONS;

PARAFFINS;

EID: 70749152362     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.05.123     Document Type: Article

References (7)

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