Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Koida, Keigo ^a   Niibe, Masahito ^b   Kakutani, Yukinobu ^a,b   Matsunari, Shuichi ^b   Aoki, Takashi ^b   Terashima, Shigeru ^b   Nakayama, Takahiro ^b   Takase, Hiromitsu ^b   Fukuda, Yasuaki ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Contamination; EUVL; IPA; Mirrors; Mo Si; Multilayer; Reduction; Ru

Indexed keywords

ATOMIC CONCENTRATION; ETHANOL VAPOR; EUV RADIATION; HYDROCARBON GAS; IPA; IRRADIATED AREA; ISOPROPYL ALCOHOLS; MO/SI MULTILAYER; MULTI-LAYER MIRRORS; OXIDE LAYER; PRESENCE OF WATER; PROJECTION OPTICS; REDUCTION EFFECTS; RU CAPPING LAYERS; SURFACE OXIDATIONS;

ETHANOL; HYDROCARBONS; IRRADIATION; MIRRORS; MULTILAYERS; OXIDATION; REFLECTION; WATER VAPOR;

RADIATION PROTECTION;

EID: 67149106435     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771814     Document Type: Conference Paper

References (5)

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