Surface charge tuning of ceria particles by titanium doping: Towards significantly improved polishing performance

Solid State Sciences

Volumn 11, Issue 12, 2009, Pages 2133-2137

  Fu, Maosheng ^a,b   Wei, Lianghua ^a   Li, Yanhua ^a   Zhou, Xuezhen ^a   Hao, Shiyou ^c   Li, Yongxiu ^a  

^a NANCHANG UNIVERSITY   (China)

^b NANCHANG HANGKONG UNIVERSITY   (China)

^c ZHEJIANG NORMAL UNIVERSITY   (China)

Author keywords

AFM; Chemical mechanical polishing; Micro scale abrasion; Surface charge; Titanium doped ceria

Indexed keywords

AFM; CERIA PARTICLES; CRYSTALLINITIES; DOPED CERIA; DOPING METHODS; LATTICE DEFECTS; MATERIAL REMOVAL RATE; MICROSCALE ABRASION; NEGATIVE ZETA POTENTIALS; PARTICLE SURFACE; PARTICLE ZETA POTENTIAL; PHASE CONTENT; POLISHING POWDER; RAMAN SPECTROSCOPIC; SUSPENSION STABILITY; TIO; XRD;

ABRASION; ATOMIC FORCE MICROSCOPY; CERIUM; CERIUM COMPOUNDS; CHARGED PARTICLES; CHEMICAL MECHANICAL POLISHING; CRYSTALLIZATION; DOPING (ADDITIVES); OPTICAL GLASS; POLISHING; POLYETHYLENES; RAMAN SPECTROSCOPY; SOLID SOLUTIONS; SOLIDIFICATION; SPECTROSCOPIC ANALYSIS; SURFACE CHARGE; SURFACE DEFECTS; SURFACES; SUSPENSIONS (FLUIDS); TITANIUM; TUNING; ZETA POTENTIAL;

CHEMICAL POLISHING;

EID: 70450245140     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2009.08.014     Document Type: Article

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