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Electrochemical and Solid-State Letters

Volumn 13, Issue 1, 2009, Pages

Electrically benign dry-etching method for rutile TiO2 thin-film capacitors with Ru electrodes

(5) Kim, Kyung Min a Lee, Sang Young a Choi, Gyu Jin a Han, Jeong Hwan a Hwang, Cheol Seong a

a Seoul National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PROCESS; CAPACITOR STRUCTURES; CLEANING SOLUTION; DRY-ETCH; ELECTRICAL PERFORMANCE; ETCHING GAS; RUTILE TIO; THIN-FILM CAPACITORS; TIO;

CAPACITANCE; CAPACITORS; CURING; DIELECTRIC FILMS; DRYING; ELECTROLYTIC CAPACITORS; LEAKAGE (FLUID); OXIDE MINERALS; PLASMA ETCHING; THIN FILM CIRCUITS; TITANIUM OXIDES;

DRY ETCHING;

EID: 70450207627 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3247971 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.