Enhancing nanoscale patterning on Ge-Sb-Sn-O inorganic resist film by introducing oxygen during blue laser-induced thermal lithography

Journal of Alloys and Compounds

Volumn 488, Issue 1, 2009, Pages 190-194

  Liu, Chung Ping ^a   Hsu, Che Chuan ^a   Jeng, Tsun Ren ^b   Chen, Jung Po ^b  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Inorganic materials; Microstructure; Nanofabrications

Indexed keywords

BLUE LASERS; DIFFRACTION LIMITS; DISSOLUTION RATES; INORGANIC MATERIALS; INORGANIC RESIST; NANO-SCALE PATTERNS; NANOFABRICATIONS; NANOSCALE PATTERNING; NUMERICAL APERTURE; RESIST FILMS; RESIST MATERIALS; THERMAL LITHOGRAPHY; TWO-STATE;

DISSOLUTION; GERMANIUM; LASERS; LITHOGRAPHY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OXYGEN; SEMICONDUCTOR QUANTUM DOTS;

TIN;

EID: 70449519141     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.08.075     Document Type: Article

References (12)

1. Kuwahara M., Mihalcea C., Atoda N., Tominga J., Fuji H., and Kikukawa T. Jpn. J. Appl. Phys. 61-62 (2002) 415-421
2. Liu C.P., Huang Y.X., Hsu C.C., Jeng T.R., and Chen J.P. IEEE Trans. Magn. 45 (2009) 2206-2208
3. Takeda M., Furuki M., Ishimoto T., Kondo K., Yamamoto M., and Kubota S. Jpn. J. Appl. Phys. 39 (2000) 797-799
4. Wada Y., Katsumura M., Kojima Y., Kitahara H., and Iida T. Jpn. J. Appl. Phys. 40 (2001) 1653-1660
5. Kuwahara M., Li J., Mihalcea C., Atoda N., Tominga J., and Shi L.P. Jpn. J. Appl. Phys. 41 (2002) L1022-1024
6. Ito E., Kawaguchi Y., Tomiyama M., Abe S., and Ohno E. Jpn. J. Appl. Phys. 44 (2005) 3574-3577
7. Y. Kawaguchi, E. Ohno, E. Ito, U.S. Patent 20050045587A1 (2005).
8. A. Kouchiyama, K. Aratani, U.S. Patent 7175962B2 (2007).
9. Amaya Kenji. Proc. SPIE 3676 (1999) 360-370
10. Meinders Erwin R., Loch Rolf A., W.O. Patent 2005101397A1 (2005).
11. Liu C.P., Jeng G.R., and Huang H.E. Mater. Trans. 48 (2007) 847-853
12. Liu C.P., and Jeng G.R. J. Alloys Compd. 468 (2008) 343-349