Thermal lithography for 100-nm dimensions using a nano-heat spot of a visible laser beam

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 9 A/B, 2002, Pages

  Kuwahara, Masashi ^a,b   Li, Jianming ^a,b   Mihalcea, Christoph ^a,b   Atoda, Nobufumi ^a,b   Tominaga, Junji ^a,b   Shi, Lu Ping ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Diffraction limit; Gaussian distribution; Lithography; Mastering; Optical ROM disk; Reversible photoresist; Thermal cross linking; Visible laser light

Indexed keywords

CROSSLINKING; ELECTROMAGNETIC WAVE DIFFRACTION; LASER BEAMS; OPTICAL SYSTEMS; SEMICONDUCTOR DEVICES;

THERMAL CROSS-LINKING;

PHOTORESISTS;

EID: 0037107052     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1022     Document Type: Article

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