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Applied Surface Science

Volumn 256, Issue 2, 2009, Pages 419-422

Microstructural evolution of tungsten oxide thin films

(3) Hembram, K P S S a,b Thomas, Rajesh a Rao, G Mohan a

a INDIAN INSTITUTE OF SCIENCE (India)

b JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH (India)

Author keywords

Annealing; Instability; Microstructure; Tungsten oxide

Indexed keywords

AMORPHOUS FILMS; ANNEALING; MICROSTRUCTURAL EVOLUTION; MICROSTRUCTURE; OXIDE FILMS; OXIDES; PLASMA STABILITY; SCANNING ELECTRON MICROSCOPY; THIN FILM DEVICES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

DC MAGNETRON SPUTTERING; EVOLUTION OF THE MICROSTRUCTURE; EXTERNAL PERTURBATIONS; MICROSTRUCTURAL CHANGES; SILICON SUBSTRATES; STRUCTURAL CHARACTERIZATION; TUNGSTEN OXIDE; TUNGSTEN OXIDE THIN FILMS;

THIN FILMS;

EID: 70449106242 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2009.06.016 Document Type: Article

Times cited : (8)

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