Multicomponent vapor deposition polymerization of poly(methyl methacrylate) in an axisymmetric vacuum reactor

Polymer

Volumn 49, Issue 7, 2008, Pages 1823-1830

  Chen, Xichong ^a   Anthamatten, Mitchell ^a  

^a University of Rochester   (United States)

Author keywords

Free radical polymerization; Thin films; Vapor deposition

Indexed keywords

MONOMERS; POLYMERIZATION; POLYMETHYL METHACRYLATES; PRESSURE CONTROL; REACTION KINETICS;

AXISYMMETRIC VACUUM REACTOR; INITIATOR MOLAR FEED RATI; MULTICOMPONENT VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

FILM; MOLECULAR WEIGHT; MONOMER; POLYMERIZATION; POLYMETHYL METHACRYLATE; REACTOR; SUBSTRATE; VACUUM;

EID: 40849125445     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2008.02.027     Document Type: Article

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