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Langmuir

Volumn 25, Issue 19, 2009, Pages 11541-11548

Enabling organosilicon chemistries on inert polymer surfaces with a vapor-deposited silica layer

(2) Anderson, A a Ashurst, W R a

a AUBURN UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS ENVIRONMENT; ATTENUATED TOTAL REFLECTION INFRARED SPECTROSCOPY; CONTACT ANGLE GONIOMETRY; FUNCTIONALIZATIONS; HYDROPHOBIC RECOVERY; INERT POLYMERS; LARGE SURFACE AREA; LOW ADHESION; LOW TEMPERATURES; ORGANOSILANE CHEMISTRY; ORGANOSILICON CHEMISTRY; PDMS SUBSTRATE; PDMS SURFACES; POLYDIMETHYLSILOXANE PDMS; POLYMER SURFACES; SILICA LAYERS; VAPOR PHASE; VOLUME RATIO;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL PROPERTIES; CONTACT ANGLE; ESTERS; INFRARED SPECTROSCOPY; MICROCHANNELS; MICROFLUIDICS; PHOTORESISTS; POLYMERS; POLYSTYRENES; SILANES; SILICA; SILICONES; SPECTROSCOPIC ANALYSIS; STAINLESS STEEL; SUBSTRATES; SURFACE CHEMISTRY; VAPORS;

SURFACE PROPERTIES;

OCTADECYLTRICHLOROSILANE; ORGANOSILICON DERIVATIVE; POLYMER; SILANE DERIVATIVE; SILICON DIOXIDE; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL PHENOMENA; CHEMISTRY; IMMERSION; INFRARED SPECTROSCOPY; MICROFLUIDIC ANALYSIS; SURFACE PROPERTY; TIME; VOLATILIZATION;

HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; IMMERSION; MICROFLUIDIC ANALYTICAL TECHNIQUES; MICROSCOPY, ATOMIC FORCE; ORGANOSILICON COMPOUNDS; POLYMERS; SILANES; SILICON DIOXIDE; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES; TIME FACTORS; VOLATILIZATION; WATER;

EID: 70349897869 PISSN: 07437463 EISSN: None Source Type: Journal
DOI: 10.1021/la9014543 Document Type: Article

Times cited : (7)

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