SCOPUS 정보 검색 플랫폼

Nanotechnology

Volumn 20, Issue 42, 2009, Pages

A nanosized photodetector fabricated by electron-beam-induced deposition

(4) Makise, K a Mitsuishi, K a Shimojo, M a,b Furuya, K a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

b SAITAMA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESIRED POSITION; ELECTRON BEAM-INDUCED DEPOSITION; MOLYBDENUM OXIDES; NANO-SIZED; SURFACE AREA; VOLUME RATIO;

ELECTRIC WIRE; MOLYBDENUM; MOLYBDENUM COMPOUNDS; OPTICAL INSTRUMENTS; OPTOELECTRONIC DEVICES;

PHOTODETECTORS;

METAL; MOLYBDENUM OXIDE; NANOWIRE; UNCLASSIFIED DRUG;

ARTICLE; CONDUCTANCE; ELECTRON BEAM; LIGHT DETECTION; OPTICAL INSTRUMENTATION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPE; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 70349706097 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/20/42/425305 Document Type: Article

Times cited : (11)

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