Technology and performances of silicon oxynitride waveguides for optomechanical sensors fabricated by plasma-enhanced chemical vapour deposition

Journal of the European Optical Society

Volumn 2, Issue , 2007, Pages

  Sabac, A ^a   Gorecki, C ^a   Jozwik, M ^a   Nieradko, L ^a   Meunier, C ^a   Gut, K ^b  

^a FEMTO ST INSTITUTE   (France)

^b SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Channel waveguide; Integrated optics; MEMS; Optomechanical sensor

Indexed keywords

INTEGRATED OPTICS; MEMS; NITRIDES; OPTICAL FIBER COUPLING; OPTICAL FIBER FABRICATION; OPTICAL WAVEGUIDES; OPTOMECHANICS; PLASMA CVD; PLASMA FILLED WAVEGUIDES; SILICON COMPOUNDS; SILICON NITRIDE; SUBSTRATES;

CHANNEL WAVEGUIDE; OPTO-MECHANICAL SENSORS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); SILICON OXY-NITRIDE THIN FILMS; SILICON OXYNITRIDE WAVEGUIDES; SINGLE MODE OPERATION; SINGLE-MODE OPTICAL FIBER;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70349660405     PISSN: None     EISSN: 19902573     Source Type: Journal    
DOI: 10.2971/jeos.2007.07026     Document Type: Article

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